Orion NanoFab Helium ion microscopy
HIM provides an effective way to image withhigh resolution better than 0.5 nm, large depth of focus and superior sensitivity to
surface detail, due to the sub-nano probe provided by Helium ionsource. As a cutting tool, HIM can produce the smallest line
width of 5 nm,which is much smaller than that of 20 nm produced by FIB. Additionally, thereis less damage to sample during
cutting by Helium ion probe than FIB due tolight weight of Helium. It allows the processing work can be done at higher magni-
fication in HIM.
功能参数 Functions and Specifications
Gas deposition /etching
●ComparisonHIM to FE-SEM
Higher resolution, <0.5 nm
Larger depth of focus
Superior sensitivityto surface detail
Observing dielectricsand biomaterials directly with the help of charge neutralizer
●ComparisonHIM to FIB
Much smallerproduced linewidth< 5 nm
Lower damage to sample
●The strong materialcontrast allows imaging of low-z materials on the ORION
●This interaction detail isshown in the single walled carbon nanotube image seen here.
Large depth of focus, superior su-rface detail andexcellent material contrast are all evident
in the OR-ION│PLUS high resolution image of Tinspheres with evaporated G-old islands
This is graphene (1 to 3 sheets) suspended over holes inan SiO2 substrate. The region was patterned with the ORION helium ion beam to produce the 5 nm graphene nano-wire, shown here.